{"id":262,"date":"2018-11-01T16:44:36","date_gmt":"2018-11-01T16:44:36","guid":{"rendered":"http:\/\/ecm.eng.auburn.edu\/wp\/amnstc\/?page_id=262"},"modified":"2019-03-15T02:25:59","modified_gmt":"2019-03-15T02:25:59","slug":"sts-ase","status":"publish","type":"page","link":"http:\/\/ecm.eng.auburn.edu\/wp\/amnstc\/test-page\/facilities\/equipment\/sts-ase\/","title":{"rendered":"STS ASE"},"content":{"rendered":"<p style=\"text-align: center\"><img loading=\"lazy\" class=\"aligncenter size-medium wp-image-167\" src=\"https:\/\/ecm.eng.auburn.edu\/wp\/amnstc\/files\/2018\/03\/STS-ASE-300x225.jpg\" alt=\"sts advanced silicon etcher\" width=\"300\" height=\"225\" srcset=\"https:\/\/ecm.eng.auburn.edu\/wp\/amnstc\/files\/2018\/03\/STS-ASE-300x225.jpg 300w, https:\/\/ecm.eng.auburn.edu\/wp\/amnstc\/files\/2018\/03\/STS-ASE-768x576.jpg 768w, https:\/\/ecm.eng.auburn.edu\/wp\/amnstc\/files\/2018\/03\/STS-ASE-1024x768.jpg 1024w\" sizes=\"(max-width: 300px) 100vw, 300px\" \/><\/p>\n<p>Description: The STS Advanced Silicon Etcher (ASE) is a deep reactive ion etching (DRIE) system used for etching highly anisotropic features into silicon wafers.<\/p>\n<p>Location: WERL Cleanroom<\/p>\n<p>Link to manufacturer information: STS ASE<\/p>\n<p>Link to SOP: STS ASE SOP<\/p>\n<p><a href=\"http:\/\/ecm.eng.auburn.edu\/wp\/amnstc\/test-page\/facilities\/equipment\/\">Up to Main Equipment Page<\/a><\/p>\n","protected":false},"excerpt":{"rendered":"<p>Description: The STS Advanced Silicon Etcher (ASE) is a deep reactive ion etching (DRIE) system used for etching highly anisotropic features into silicon wafers. Location: WERL Cleanroom Link to manufacturer information: STS ASE Link to SOP: STS ASE SOP Up to Main Equipment Page<\/p>\n","protected":false},"author":39,"featured_media":0,"parent":44,"menu_order":7,"comment_status":"closed","ping_status":"closed","template":"","meta":[],"_links":{"self":[{"href":"http:\/\/ecm.eng.auburn.edu\/wp\/amnstc\/wp-json\/wp\/v2\/pages\/262"}],"collection":[{"href":"http:\/\/ecm.eng.auburn.edu\/wp\/amnstc\/wp-json\/wp\/v2\/pages"}],"about":[{"href":"http:\/\/ecm.eng.auburn.edu\/wp\/amnstc\/wp-json\/wp\/v2\/types\/page"}],"author":[{"embeddable":true,"href":"http:\/\/ecm.eng.auburn.edu\/wp\/amnstc\/wp-json\/wp\/v2\/users\/39"}],"replies":[{"embeddable":true,"href":"http:\/\/ecm.eng.auburn.edu\/wp\/amnstc\/wp-json\/wp\/v2\/comments?post=262"}],"version-history":[{"count":2,"href":"http:\/\/ecm.eng.auburn.edu\/wp\/amnstc\/wp-json\/wp\/v2\/pages\/262\/revisions"}],"predecessor-version":[{"id":297,"href":"http:\/\/ecm.eng.auburn.edu\/wp\/amnstc\/wp-json\/wp\/v2\/pages\/262\/revisions\/297"}],"up":[{"embeddable":true,"href":"http:\/\/ecm.eng.auburn.edu\/wp\/amnstc\/wp-json\/wp\/v2\/pages\/44"}],"wp:attachment":[{"href":"http:\/\/ecm.eng.auburn.edu\/wp\/amnstc\/wp-json\/wp\/v2\/media?parent=262"}],"curies":[{"name":"wp","href":"https:\/\/api.w.org\/{rel}","templated":true}]}}